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Article Dans Une Revue ChemNanoMat Année : 2017

A Novel Two-Step Ammonia-Free Atomic Layer Deposition Approach for Boron Nitride

Résumé

Due to their high potential in energy and environment domains, synthetic approach allowing fabrication of high quality boron nitride (BN) structures in a controlled manner is of great interest. Herein, a two-step ammonia-free atomic layer deposition approach of BN, based on polymer derived ceramics chemistry is reported for the first time. Using trichloroborazine and hexamethyldisilazane as precursors, conformal pre-ceramic polymer layer is grown at low temperature, 80 °C, and then converted into dense hexagonal BN (h-BN). The present approach allows conformal and homogeneous deposition of h-BN films on various substrates with a thickness control at the atomic scale. It proves to be successful for fabricating various tuned BN nanostructures and composites that showed to be efficient in water purification. In particular, the obtained nanostructures demonstrate high hydrophobicity and they are investigated as water filter for organic/water separation. Good separation efficiency is demonstrated that highlights the high potential of such atomic layer deposition (ALD) structures in water treatment.

Domaines

Chimie Matériaux
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Dates et versions

hal-02106422 , version 1 (23-06-2020)

Identifiants

Citer

Wenjun Hao, Catherine Marichy, Catherine Journet, Arnaud Brioude. A Novel Two-Step Ammonia-Free Atomic Layer Deposition Approach for Boron Nitride. ChemNanoMat, 2017, 3 (9), pp.656-663. ⟨10.1002/cnma.201700148⟩. ⟨hal-02106422⟩
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