High-pressure melt growth and transport properties of SiP, SiAs, GeP, and GeAs 2D layered semiconductors - Archive ouverte HAL
Article Dans Une Revue Journal of Crystal Growth Année : 2016

High-pressure melt growth and transport properties of SiP, SiAs, GeP, and GeAs 2D layered semiconductors

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Cristallographie

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hal-02104553 , version 1 (19-04-2019)

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Céline Barreteau, B. Michon, C. Besnard, E. Giannini. High-pressure melt growth and transport properties of SiP, SiAs, GeP, and GeAs 2D layered semiconductors. Journal of Crystal Growth, 2016, 443, pp.75-80. ⟨10.1016/j.jcrysgro.2016.03.019⟩. ⟨hal-02104553⟩
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