Journal Articles
Defect and Diffusion Forum
Year : 2015
Christophe Girardeaux : Connect in order to contact the contributor
https://amu.hal.science/hal-02044836
Submitted on : Thursday, February 21, 2019-4:34:53 PM
Last modification on : Monday, June 10, 2024-4:58:03 PM
Dates and versions
Identifiers
- HAL Id : hal-02044836 , version 1
- DOI : 10.4028/www.scientific.net/DDF.363.56
Cite
Alain Portavoce, Omar Abbes, Sylvain Bertaina, Yauheni Rudzevich, Lee Chow, et al.. Mn Diffusion and Reactive Diffusion in Ge: Spintronic Applications. Defect and Diffusion Forum, 2015, 363, pp.56-61. ⟨10.4028/www.scientific.net/DDF.363.56⟩. ⟨hal-02044836⟩
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