A band-modulation device in advanced FDSOI technology: Sharp switching characteristics - Archive ouverte HAL
Article Dans Une Revue Solid-State Electronics Année : 2016

A band-modulation device in advanced FDSOI technology: Sharp switching characteristics

Résumé

A band-modulation device is demonstrated experimentally in advanced FDSOI (Fully Depleted SOI). The Z2-FET (Zero Impact Ionization and Zero Subthreshold Slope FET) is a very recent sharp switching device which achieves remarkable performance in terms of leakage current and triggering control. The device is fabricated with Ultra-Thin Body and Buried Oxide (UTBB) Silicon-On-Insulator (SOI) technology, features an extremely sharp on-switch, low leakage and an adjustable triggering voltage (VON). The Z2-FET operation relies on the modulation of electrons and holes injection barriers. In this paper, we show, for the first time, experimental data obtained with the most advanced FDSOI node.
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Dates et versions

hal-02003135 , version 1 (01-02-2019)

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Hassan El Dirani, Yohann Solaro, Pascal Fonteneau, Charles-Alex Legrand, David Marin-Cudraz, et al.. A band-modulation device in advanced FDSOI technology: Sharp switching characteristics. Solid-State Electronics, 2016, 125, pp.103-110. ⟨10.1016/j.sse.2016.07.018⟩. ⟨hal-02003135⟩
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