Communication Dans Un Congrès Année : 2011

Alpha-Soft Error Rate due to new generations of high-k gate oxides and metal gate electrodes in a 32 nm node

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hal-01937444 , version 1 (28-11-2018)

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  • HAL Id : hal-01937444 , version 1

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M. Gedion, Frédéric Wrobel, F. Saigné, R. D. Schrimpf. Alpha-Soft Error Rate due to new generations of high-k gate oxides and metal gate electrodes in a 32 nm node. RADECS 2011, 2011, Seville, Spain. ⟨hal-01937444⟩
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