Influence of PECVD SiOx and SiNx:H films on optical and passivation properties of antireflective porous silicon coatings for silicon solar cells - Archive ouverte HAL
Article Dans Une Revue physica status solidi (c) Année : 2011

Influence of PECVD SiOx and SiNx:H films on optical and passivation properties of antireflective porous silicon coatings for silicon solar cells

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hal-01890411 , version 1 (15-10-2018)

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L. Remache, A. Mahdjoub, E. Fourmond, J. Dupuis, M. Lemiti. Influence of PECVD SiOx and SiNx:H films on optical and passivation properties of antireflective porous silicon coatings for silicon solar cells. physica status solidi (c), 2011, 8 (6), pp.1893 - 1897. ⟨10.1002/pssc.201000110⟩. ⟨hal-01890411⟩
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