Photoluminescence from InGaAs/GaAs quantum well regrown on a buried patterned oxidized AlAs layer - Archive ouverte HAL
Article Dans Une Revue Applied Physics Letters Année : 2014

Photoluminescence from InGaAs/GaAs quantum well regrown on a buried patterned oxidized AlAs layer

Stéphane Calvez
Chantal Fontaine
Guilhem Almuneau

Résumé

We present a quasi-planar technological approach for forming a flexible and versatile confinement scheme based on oxidation of AlGaAs buried layers combined to an epitaxial regrowth. This method improves the electrical and optical confinements compared to the lateral oxidation since it allows to define confinement areas from a planar surface. This technique is suitable for the realization of advanced integrated photonic components arrays with close device-to-device spacing such as two-dimensional arrays of vertical-cavity surface-emitting lasers. Our results prove that the oxidation and epitaxial regrowth can be sequenced in a process flow, leading to viable confinement while preserving good radiative properties.
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hal-01857529 , version 1 (16-08-2018)

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Fares Chouchane, Hajer Makhloufi, Stéphane Calvez, Chantal Fontaine, Guilhem Almuneau. Photoluminescence from InGaAs/GaAs quantum well regrown on a buried patterned oxidized AlAs layer. Applied Physics Letters, 2014, 104 (6), pp.061912. ⟨10.1063/1.4865419⟩. ⟨hal-01857529⟩
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