X-ray photoelectron spectroscopy and diffraction investigation of a metal–oxide-semiconductor heterostructure: Pt/Gd2O3/Si(111) - Archive ouverte HAL
Article Dans Une Revue Journal of Crystal Growth Année : 2015

X-ray photoelectron spectroscopy and diffraction investigation of a metal–oxide-semiconductor heterostructure: Pt/Gd2O3/Si(111)

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hal-01848746 , version 1 (25-07-2018)

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D. Ferrah, M. El Kazzi, G. Niu, Claude Botella, J. Penuelas, et al.. X-ray photoelectron spectroscopy and diffraction investigation of a metal–oxide-semiconductor heterostructure: Pt/Gd2O3/Si(111). Journal of Crystal Growth, 2015, 416, pp.118 - 125. ⟨10.1016/j.jcrysgro.2015.02.001⟩. ⟨hal-01848746⟩
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