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Article Dans Une Revue Nanotechnology Année : 2010

High-k Hf-based layers grown by RF magnetron sputtering

Résumé

Structural and chemical properties of Hf-based layers fabricated by RF magnetron sputtering were studied by means of x-ray diffraction, transmission electron microscopy and attenuated total reflection infrared spectroscopy versus the deposition parameters and annealing treatment. The deposition and post-deposition conditions allow us to control the temperature of the amorphous–crystalline phase transition of HfO 2-based layers. It was found that silicon incorporation in an HfO 2 matrix plays the main role in the structural stability of the layers. It allows us not only to decrease the thickness of the film/substrate interfacial layer to 1 nm, but also to conserve the amorphous structure of the layers after an annealing treatment up to 900–1000°C

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Matériaux
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Dates et versions

hal-01820398 , version 1 (21-06-2018)

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Larysa Khomenkova, C. Dufour, Pierre-Eugène Coulon, Caroline Bonafos, F. Gourbilleau. High-k Hf-based layers grown by RF magnetron sputtering. Nanotechnology, 2010, 21 (9), ⟨10.1088/0957-4484/21/9/095704⟩. ⟨hal-01820398⟩
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