Process induced strains in FDSOI devices: a contribution of dark-field electron holography - Archive ouverte HAL
Communication Dans Un Congrès Année : 2015

Process induced strains in FDSOI devices: a contribution of dark-field electron holography

Victor Boureau
Benoit Daniel
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Dates et versions

hal-01763625 , version 1 (11-04-2018)

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  • HAL Id : hal-01763625 , version 1

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Victor Boureau, Martin Hÿtch, Benoit Daniel, Alain Claverie. Process induced strains in FDSOI devices: a contribution of dark-field electron holography . Micro and Nano 2015, Oct 2015, Athenes, Greece. ⟨hal-01763625⟩
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