Layered HfSiON-based tunnel stacks for voltage reduction and improved reliability in TANOS memories - Archive ouverte HAL
Communication Dans Un Congrès Année : 2010

Layered HfSiON-based tunnel stacks for voltage reduction and improved reliability in TANOS memories

F. Martin
  • Fonction : Auteur
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hal-01745640 , version 1 (28-03-2018)

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G. Molas, Marc Bocquet, J. Colonna, V. Vidal, R. Kies, et al.. Layered HfSiON-based tunnel stacks for voltage reduction and improved reliability in TANOS memories. Proceedings of 2010 International Symposium on VLSI Technology, System and Application, Apr 2010, Hsin Chu, France. ⟨10.1109/VTSA.2010.5488949⟩. ⟨hal-01745640⟩
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