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Communication Dans Un Congrès Année : 1994

Photolithography for recessed lift-off technology application to low temperature GaAs MISFET’s ohmic contacts

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hal-01654282 , version 1 (03-12-2017)

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  • HAL Id : hal-01654282 , version 1

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B. Boudart, Christophe Robert, Didier Theron, R. Westphalen. Photolithography for recessed lift-off technology application to low temperature GaAs MISFET’s ohmic contacts. 4th European Workshop on Heterostructure Technology (HETECH), 1994, Ulm, Germany. ⟨hal-01654282⟩
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