XPS analysis of the lithium intercalation in amorphous tungsten oxysulfide thin films - Archive ouverte HAL
Article Dans Une Revue Journal of Power Sources Année : 1999

XPS analysis of the lithium intercalation in amorphous tungsten oxysulfide thin films

Résumé

Amorphous thin films of tungsten oxysulfide have been prepared by radio frequency (RF) magnetron sputtering. The composition of thin films is varied by changing the pressure of the reactive gas (O2) and discharge gas (Ar + O2) in the sputtering chamber. The X-ray photoelectron spectroscopy (XPS) studies of the thin films have shown three different types of environment for tungsten atoms: W6+ surrounded by oxygen O2-, W4+ surrounded by sulphur S2- and W5+ in a mixed oxygen-sulphur environment consisting of O2-, S2- and S22- pairs. The electrochemical characterisation of the film was performed in the Li/LiPF6-EC-DMC/WOySz cell. The XPS during intercalation evidences the role of W6+ and S22- in the redox process. © 1999 Elsevier Science S.A. All rights reserved.

Dates et versions

hal-01636426 , version 1 (16-11-2017)

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Isabelle Martin, Philippe Vinatier, Alain Levasseur, Jean-Charles Dupin, Danielle Gonbeau. XPS analysis of the lithium intercalation in amorphous tungsten oxysulfide thin films. Journal of Power Sources, 1999, 81-82, pp.306-311. ⟨10.1016/S0378-7753(99)00129-9⟩. ⟨hal-01636426⟩
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