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Chapitre D'ouvrage Année : 2016

Silicon Nanostructures for Photovoltaics

Résumé

SiOx/SiO2 and SiOx/SiNx multilayers have been grown by reactive magnetron sputtering. Different fabrication parameters have been studied to optimize the density of Si nanoparticles (Si-nps) within the SiOx sublayer. The aim is to favor the optical properties of the film as well as the carrier transport for the future development of Si-np-based solar device. This chapter evidences the beneficial role of the SiNx sublayer on the achievement of good optical properties in a lower thermal budget with respect to the SiOx/SiO2 counterparts.
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Dates et versions

hal-01631007 , version 1 (25-06-2018)

Identifiants

  • HAL Id : hal-01631007 , version 1

Citer

Fabrice Gourbilleau, Ramesh Pratibha Nalini, Julien Cardin, Christian Dufour, Odile Cristini-Robbe, et al.. Silicon Nanostructures for Photovoltaics. Leonid Khriachtchev. Silicon Nanophotonics: Basic Principles, Present Status, and Perspectives, Second Edition, Pan Stanford Publishing, pp.429-456, 2016, 9789814669771. ⟨hal-01631007⟩
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