Convenient graphene-based quantum Hall resistance standards - Archive ouverte HAL
Communication Dans Un Congrès Année : 2016

Convenient graphene-based quantum Hall resistance standards

Résumé

We report on measurements in large quantum Hall devices, made of high-quality graphene grown by propane/hydrogen chemical vapor deposition on SiC. These devices, having all the properties of an ideal quantum electrical resistance standard, surpass state-of-the-art GaAs/AlGaAs devices by considerable margins in their operational conditions. The Hall resistance can be found accurately quantized within one part in 109 over a 10-T range of magnetic fields with a lower bound at 3.5 T, temperatures as high as 10 K, or currents as high as 0.5 mA. This simplification sets the superiority of graphene for accessible and low-cost primary resistance standards.
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Dates et versions

hal-01617109 , version 1 (16-10-2017)

Identifiants

Citer

J. Brun-Picard, R. Ribeiro-Palau, F. Lafont, A. Michon, F. Cheynis, et al.. Convenient graphene-based quantum Hall resistance standards. CPEM 2016, Jul 2016, Ottawa, Canada. pp.117-120, ⟨10.1109/CPEM.2016.7540650⟩. ⟨hal-01617109⟩
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