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Communication Dans Un Congrès Année : 2017

Overcoming practical limitations of even order missing gratings and diffractive optical elements to improve diffraction pattern fidelity and contrast in machine vision applications

Julien Le Meur
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Bruno Fracasso
Kevin Heggarty

Résumé

We show how inevitable Diffractive Optical Elements (DOEs) fabrication imperfections lead to parasitic orders in the diffraction patterns of Even Order Missing (EOM) gratings and DOEs, limiting the attainable pattern signal to noise ratio (SNR) in machine vision applications. Using odd pixel numbered target patterns is then shown to be a highly effective simple way of eliminating the problem.
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hal-01615217 , version 1 (27-05-2021)

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  • HAL Id : hal-01615217 , version 1

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Julien Le Meur, Bruno Fracasso, Kevin Heggarty. Overcoming practical limitations of even order missing gratings and diffractive optical elements to improve diffraction pattern fidelity and contrast in machine vision applications. DO 2017 : EOS Topical meeting on diffractive Optics, Sep 2017, Joensuu, Finland. ⟨hal-01615217⟩
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