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Journal Articles Nano Letters Year : 2015

Quantum Dot Made in Metal Oxide Silicon-Nanowire Field Effect Transistor Working at Room Temperature

Abstract

We report the observation of an atomic like behavior from T = 4.2 K up to room temperature in n- and p-type Omega-gate silicon nanowire (NW) transistors. For that purpose, we modified the design of a NW transistor and introduced long spacers between the source/drain and the channel in order to separate the channel from the electrodes. The channel was made extremely small (3.4 nm in diameter with 10 nm gate length) with a thick gate oxide (7 nm) in order to enhance the Coulomb repulsion between carriers, which can be as large as 200 meV when surface roughness promotes charge confinement. Parasitic stochastic Coulomb blockade effect can be eliminated in our devices by choosing proper control voltages. Moreover, the quantum dot can be tuned so that the resonant current at T = 4.2 K exceeds that at room temperature.
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Dates and versions

hal-01615209 , version 1 (12-10-2017)

Identifiers

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Romain Lavieville, François Triozon, Sylvain Barraud, Andrea Corna, Xavier Jehl, et al.. Quantum Dot Made in Metal Oxide Silicon-Nanowire Field Effect Transistor Working at Room Temperature. Nano Letters, 2015, 15 (5), pp.2958-2964. ⟨10.1021/nl504806s⟩. ⟨hal-01615209⟩
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