Nanofabrication of silicon Mie resonators and all-dielectric colored metasurfaces
Résumé
Silicon Mie resonators and metasurfaces were nanofabricated using electron beam lithography followed by wet chemical alkaline etching or reactive ion etching. The fabrication process was adapted for both amorphous and monocrystalline silicon in order to obtain efficient resonant light scattering by individual silicon particles. A large palette of colors was created by tuning the size, shape and aspect ratio of the particles.
| Origine | Fichiers produits par l'(les) auteur(s) |
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