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Communication Dans Un Congrès Année : 2017

Nanofabrication of silicon Mie resonators and all-dielectric colored metasurfaces

Bruno Gallas
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Nicolas Bonod

Résumé

Silicon Mie resonators and metasurfaces were nanofabricated using electron beam lithography followed by wet chemical alkaline etching or reactive ion etching. The fabrication process was adapted for both amorphous and monocrystalline silicon in order to obtain efficient resonant light scattering by individual silicon particles. A large palette of colors was created by tuning the size, shape and aspect ratio of the particles.
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Dates et versions

hal-01577657 , version 1 (27-08-2017)

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  • HAL Id : hal-01577657 , version 1

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Igor Ozerov, Julien Proust, Frédéric Bedu, Bruno Gallas, Nicolas Bonod. Nanofabrication of silicon Mie resonators and all-dielectric colored metasurfaces. META’17, the 8th International Conference on Metamaterials, Photonic Crystals and Plasmonics, Jul 2017, Incheon - Seoul, South Korea. ⟨hal-01577657⟩
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