Direct observation of ozone formation on SiO<SUB>2</SUB> surfaces in O<SUB>2</SUB> discharges - Archive ouverte HAL
Article Dans Une Revue Journal of Physics D: Applied Physics Année : 2013

Direct observation of ozone formation on SiO2 surfaces in O2 discharges

Résumé

Ozone production is studied in a pulsed O2 discharge at pressures in the range 1.3–6.7 mbar. Time-resolved absolute concentrations of O3 and O are measured in the post-discharge using UV absorption spectroscopy and two-photon absorption laser-induced fluorescence. In a bare silica discharge tube ozone is formed mainly by three-body gas-phase recombination. When the tube surface is covered by a high specific surface silica catalyst heterogeneous formation becomes the main source of ozone. The efficiency of this surface process increases with O2 pressure and is favoured by the presence of OH groups and adsorbed H2O on the surface. At p = 6.7 mbar ozone production accounts for up to 25% of the atomic oxygen losses on the surface.
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Dates et versions

hal-01549402 , version 1 (28-06-2017)

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Daniil Marinov, Olivier Guaitella, Jean-Paul Booth, Antoine Rousseau. Direct observation of ozone formation on SiO2 surfaces in O2 discharges. Journal of Physics D: Applied Physics, 2013, 46, pp.032001. ⟨10.1088/0022-3727/46/3/032001⟩. ⟨hal-01549402⟩
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