TEM and IBA study of the thermal oxidation of V following high dose He implantation - Archive ouverte HAL
Article Dans Une Revue Journal of Nuclear Materials Année : 1997

TEM and IBA study of the thermal oxidation of V following high dose He implantation

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hal-01513005 , version 1 (24-04-2017)

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P.W Gilberd, P.B Johnson, I.C Vickridge, A.C Wismayer. TEM and IBA study of the thermal oxidation of V following high dose He implantation. Journal of Nuclear Materials, 1997, 244 (1), pp.51 - 58. ⟨10.1016/S0022-3115(96)00726-X⟩. ⟨hal-01513005⟩
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