Reversible Silylene Insertion Reactions into Si−H and P−H σ-Bonds at Room Temperature
Résumé
Phosphine-stabilized silylenes react with silanes and a phosphine by silylene insertion into E−H σ-bonds (E=Si,P) at room temperature to give the corresponding silanes. Of special interest, the process occurs reversibly at room temperature. These results demonstrate that both the oxidative addition (typical reaction for transient silylenes) and the reductive elimination processes can proceed at the silicon center under mild reaction conditions. DFT calculations provide insight into the importance of the coordination of the silicon center to achieve the reductive elimination step. © 2016 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim
Mots clés
Crystallography
density functional calculations
Density functional theory
Insertion reactions
Mild reaction conditions
Oxidative additions
Phosphorus compounds
Reactive intermediate
reactive intermediates
Reductive elimination
Silanes
Silicon centers
silylenes
structure elucidation
X ray crystallography
X-ray crystallography