Self-catalyzed growth of GaAs nanowires on silicon by HVPE - Archive ouverte HAL
Communication Dans Un Congrès Année : 2016

Self-catalyzed growth of GaAs nanowires on silicon by HVPE

Zhenning Dong
  • Fonction : Auteur
Yamina Andre
  • Fonction : Auteur
Vladimir Dubrovskii
  • Fonction : Auteur
Catherine Bougerol
Guillaume Monier
Reda Ramdani
  • Fonction : Auteur
Agnes Trassoudaine
Dominique Castelluci
  • Fonction : Auteur
Evelyne Gil

Résumé

We report on the first self -catalyzed growth of GaAs nanowires on patterned and non -patterned silicon (111) wafers by hydride vapor phase epitaxy (HVPE) with a record elongation rate of 30 !lm/h. The crystalline structure was analyzed using high resolution transmission electron microscopy (HRTEM). Self -catalyzed growth proceeds under gallium rich conditions at low -temperature (600 C). Nanowires exhibit cylindrical rod -like shape morphology with a mean diameter of 50 nm and are randomly distributed.
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Dates et versions

hal-01435124 , version 1 (13-01-2017)

Identifiants

Citer

Zhenning Dong, Yamina Andre, Vladimir Dubrovskii, Catherine Bougerol, Guillaume Monier, et al.. Self-catalyzed growth of GaAs nanowires on silicon by HVPE. 2016 International Conference Laser Optics (LO), Jun 2016, St Petersburg, Russia. ⟨10.1109/LO.2016.7549901⟩. ⟨hal-01435124⟩
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