Laser near-field enhancements underneath transparent microspheres can be used to locally implement new functionalities in materials. Using this technique, we report micro-and nano-structuration on silicon (Si). The Langmuir-Blodgett (LB) technique is primarily used to realize monolayers of C18 functionalized silica (SiO2) microspheres on a large size area of the substrates. Afterwards, by irradiating the deposited monolayer with single shot UV nanosecond laser pulses in the ablation regime, we demonstrate the formation of dense arrays of craters in silicon substrate. In particular, we describe our works to obtain mono dispersed craters of sub micrometer size using LB technique and taking the fluence and sphere size as variable process parameters. Finite-difference time-domain (FDTD) simulations are presented to estimate the enhancement intensity factor and near-field distribution below the spheres in the experiments.