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Chapitre D'ouvrage Année : 2016

Design of new block-copolymer systems to achieve thick-films with defect-free structures for applications of DSA into lithographic large nodes

Xavier Chevalier
Ian Cayrefourcq
  • Fonction : Auteur

Résumé

Properties of new block copolymers systems, specifically designed to reach large periods for the features, are compared to the ones exhibited by classical PS-b-PMMA materials of same dimensions. Conducted studies, like free-surface defects analysis, mild-plasma tomography experiments, graphoepitaxy-guided structures, etch-transfer. indicate much better performances, in terms of achievable film-thicknesses with perpendicular features, defects levels, and dimensional uniformities, for the new system than for the classical PS-b-PMMA. These results clearly highlight unique and original solutions toward an early introduction of DSA technology into large lithographic nodes.

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Polymères
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Dates et versions

hal-01406087 , version 1 (30-11-2016)

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Xavier Chevalier, Paul Coupillaud, Geoffrey Lombard, Célia Nicolet, Julien Beausoleil, et al.. Design of new block-copolymer systems to achieve thick-films with defect-free structures for applications of DSA into lithographic large nodes. ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXIII, 9779, pp.Art. No. 977913, 2016, Book Series: Proceedings of SPIE, ISBN:978-1-5106-0014-0. ⟨10.1117/12.2219214⟩. ⟨hal-01406087⟩
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