In Situ Controlled Growth of Titanium Nitride in Amorphous Silicon Nitride: A General Route Toward Bulk Nitride Nanocomposites with Very High Hardness - Archive ouverte HAL
Article Dans Une Revue Advanced Materials Année : 2014

In Situ Controlled Growth of Titanium Nitride in Amorphous Silicon Nitride: A General Route Toward Bulk Nitride Nanocomposites with Very High Hardness

Résumé

Bulk nanocomposites possessing very high hardness in which TiN nanocrystallites are homogeneously embedded in an amorphous Si3N4 matrix are produced from perhydropolysilazane and tetrakisdimethylaminotitanium. That is, a low-molecular-weight TiN molecule is mixed in controlled molar ratio with a polymeric Si3N4 precursor; further processing, including ammonolysis, warm pressing, and controlled nanocrystal growth, yields nanocomposites with the desired properties.

Domaines

Matériaux

Dates et versions

hal-01275056 , version 1 (16-02-2016)

Identifiants

Citer

Mirna Chaker Bechelany, Vanessa Proust, Christel Gervais, Rudy Ghisleni, Samuel Bernard, et al.. In Situ Controlled Growth of Titanium Nitride in Amorphous Silicon Nitride: A General Route Toward Bulk Nitride Nanocomposites with Very High Hardness. Advanced Materials, 2014, 26 (38), pp.6548-6553. ⟨10.1002/adma.201402356⟩. ⟨hal-01275056⟩
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