Thermal stability of Co/C multilayers - Archive ouverte HAL
Article Dans Une Revue Materials Research Express Année : 2014

Thermal stability of Co/C multilayers

Résumé

The structural and interface changes induced by thermal annealing in Co/C multilayers were investigated. Co/C multilayers with period thickness of 4.1 nm and bi-layer number of 20 were deposited by direct current magnetron sputtering. We characterized all samples by using x-ray reflectivity, x-ray diffuse scattering, zero-field nuclear magnetic resonance spectroscopy and x-ray dif-fraction. The results indicate that Co and C atoms mixed during deposition and then after annealing both atoms separated from their mixed region. The annealing process also causes a sharp increase of roughness at interfaces, which can be attributed to the crystallization of Co layers.
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Dates et versions

hal-01238002 , version 1 (08-12-2015)

Identifiants

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Jingtao Zhu, Yuchun Tu, Yanyan Yuan, Zhixiang Feng, Haochuan Li, et al.. Thermal stability of Co/C multilayers . Materials Research Express, 2014, 1, pp.046503. ⟨10.1088/2053-1591/1/4/046503⟩. ⟨hal-01238002⟩
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