Thermal stability of Co/C multilayers
Résumé
The structural and interface changes induced by thermal annealing in Co/C multilayers were investigated. Co/C multilayers with period thickness of 4.1 nm and bi-layer number of 20 were deposited by direct current magnetron sputtering. We characterized all samples by using x-ray reflectivity, x-ray diffuse scattering, zero-field nuclear magnetic resonance spectroscopy and x-ray dif-fraction. The results indicate that Co and C atoms mixed during deposition and then after annealing both atoms separated from their mixed region. The annealing process also causes a sharp increase of roughness at interfaces, which can be attributed to the crystallization of Co layers.
Domaines
Autre [cond-mat.other]Origine | Fichiers produits par l'(les) auteur(s) |
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