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Journal Articles Nano Letters Year : 2015

Strain Relaxation in CVD Graphene: Wrinkling with Shear Lag

Abstract

We measure uniaxial strain fields in the vicinity of edges and wrinkles in graphene prepared by chemical vapor deposition (CVD), by combining microscopy techniques and local vibrational characterization. These strain fields have magnitudes of several tenths of a percent and extend across micrometer distances. The nonlinear shear-lag model remarkably captures these strain fields in terms of the graphene–substrate interaction and provides a complete understanding of strain-relieving wrinkles in graphene for any level of graphene–substrate coherency.
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hal-01187043 , version 1 (25-08-2015)

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Merijntje S Bronsgeest, Nedjma Bendiab, Shashank Mathur, Amina Kimouche, Harley T. Johnson, et al.. Strain Relaxation in CVD Graphene: Wrinkling with Shear Lag. Nano Letters, 2015, 15 (8), pp.5098. ⟨10.1021/acs.nanolett.5b01246⟩. ⟨hal-01187043⟩
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