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Communication Dans Un Congrès Année : 2014

Challenges in suspending CVD graphene: More than capillary effects

Résumé

It is known that the fabrication of graphene NEMS raises several technological issues. Beyond capillarity effects, the quality of the interface between graphene and resist is the most critical challenge. In this paper we propose a high yield route for the fabrication of suspended graphene structures, using technological steps compatible with large-scale fabrication. AFM and Raman characterization results are used to probe suspension, added defects and strain evolution during the process.
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Dates et versions

hal-01182155 , version 1 (30-07-2015)

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O.I. Aydin, T. Hallam, J.L. Thomassin, Mouis M., G. Duesberg. Challenges in suspending CVD graphene: More than capillary effects. 2014 15th International Conference on Ultimate Integration on Silicon (ULIS), Apr 2014, Stockholm, Sweden. pp.33-36, ⟨10.1109/ULIS.2014.6813899⟩. ⟨hal-01182155⟩
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