Special issue on “Current Trends in Optical and X-Ray Metrology of Advanced Materials for Nanoscale Devices III”, E-MRS Spring 2012 — Symposium W, held in Strasbourg, France, May 14–18, 2012 - Archive ouverte HAL
Communication Dans Un Congrès Année : 2012

Special issue on “Current Trends in Optical and X-Ray Metrology of Advanced Materials for Nanoscale Devices III”, E-MRS Spring 2012 — Symposium W, held in Strasbourg, France, May 14–18, 2012

Résumé

This special volume of Thin Solid Films is devoted to selected papers presented at Symposium W, " Current Trends in Optical and X-Ray Metrology of Advanced Materials for Nanoscale Devices III " , held in Strasbourg, France, May 14–18, 2012.

Domaines

Optique / photonique

Olivier Durand  : Connectez-vous pour contacter le contributeur

https://hal.science/hal-01166861

Soumis le : mardi 23 juin 2015-14:52:34

Dernière modification le : lundi 16 septembre 2024-17:52:04

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Dates et versions

hal-01166861 , version 1 (23-06-2015)

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Citer

Mircea Modreanu, Olivier Durand, Gerald Jellison, Giancarlo Salviati, Miklos Fried. Special issue on “Current Trends in Optical and X-Ray Metrology of Advanced Materials for Nanoscale Devices III”, E-MRS Spring 2012 — Symposium W, held in Strasbourg, France, May 14–18, 2012. European Materials Research Society Spring Meeting 2012 (E-MRS 2012 Spring Meeting), May 2012, Strasbourg, France. pp.1-2, ⟨10.1016/j.tsf.2013.07.027⟩. ⟨hal-01166861⟩

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