This work focuses on the structural and electrical characterization of La-Ni-O coatings deposited by reactive magnetron sputtering using Plasma Emission Monitoring (PEM) which allows high deposition rate. The optimal regulation setpoint for lanthanumdeposition is determined and then the current dissipated on the nickel target is adjusted to obtain the convenient La/Ni ratio to achieve the K2NiF4 structure. After an appropriate annealing treatment, all coatings exhibit crystalline structures that depend on the La/Ni ratio. Some cracks appear on samples deposited on alumina substrates depending to the argon flow rate and influence their electrical behavior.