Gas aggregation source based on pulsed plasma sputtering for the synthesis of PtX catalytic nanoclusters
Résumé
The gas-aggregation source technique with a planar magnetron is used for the production of PtX (X = Pd or Au) catalyst nanoclusters on polymeric substrate used in low temperature fuel cell. The target material is sputtered by employing either a DC power supply or a high-power impulse magnetron sputtering power device known to enhance the degree of ionization of the target species. The nanocluster properties are studied as a function of the power characteristics by diagnostics like time-of-flight mass spectrometer and post deposition methods (Grazing Incidence X-Ray Diffraction, Transmission Electron Microscopy) compared to those obtained by standard DC magnetron sputtering.
Origine | Fichiers produits par l'(les) auteur(s) |
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