Functional dielectric oxide and oxynitride perovskite thin films deposited by reactive magnetron sputtering - Archive ouverte HAL
Communication Dans Un Congrès Année : 2014

Functional dielectric oxide and oxynitride perovskite thin films deposited by reactive magnetron sputtering

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Matériaux
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hal-01019911 , version 1 (07-07-2014)

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  • HAL Id : hal-01019911 , version 1

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Claire Le Paven-Thivet, Ratiba Benzerga, Laurent Le Gendre, Yu Lu, Viet Hung Nguyen, et al.. Functional dielectric oxide and oxynitride perovskite thin films deposited by reactive magnetron sputtering. Microwave Materials and their Application (MMA 2014), Jun 2014, Boston, Idaho, United States. ⟨hal-01019911⟩
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