Study of elastic behavior of metallic thin films by 2D synchrotron XRD and in situ tensile testing - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Materials Research Society Symposium Proceedings Année : 2007

Study of elastic behavior of metallic thin films by 2D synchrotron XRD and in situ tensile testing

Résumé

Understanding the mechanical behavior of nano-structured thin films in relation to their structure, in particular to the grain size, is of high importance for the development of technological applications. In this work, model nanometric multilayer W/Au systems exhibiting different structures are elaborated. These films are supported by a (thin) polyimide substrate. Films mechanical response is characterized experimentally by tensile tests carried out in-situ in a X-ray diffractometer set on a synchrotron source. Transmission X-ray diffraction has been used to study the deformations of both W and Au sublayers as a function of the applied load. This geometry has been developed in the aim of optimizing the experiment time.
Fichier principal
Vignette du fichier
GRG.pdf (249.43 Ko) Télécharger le fichier
Origine : Fichiers produits par l'(les) auteur(s)
Loading...

Dates et versions

hal-01007341 , version 1 (16-06-2014)

Licence

Paternité

Identifiants

Citer

Guillaume Geandier, Pierre-Olivier Renault, Philippe Goudeau, Eric Le Bourhis, Baptiste Girault. Study of elastic behavior of metallic thin films by 2D synchrotron XRD and in situ tensile testing. Materials Research Society Symposium Proceedings, 2007, 1027, pp.1-6. ⟨10.1557/PROC-1027-D01-09⟩. ⟨hal-01007341⟩

Collections

CNRS UNIV-POITIERS
73 Consultations
93 Téléchargements

Altmetric

Partager

Gmail Facebook X LinkedIn More