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Article Dans Une Revue IEEE Transactions on Plasma Science Année : 2014

Influence of the HiPIMS voltage on the time resolved platinum ions energy distributions

Résumé

High Power Impulse magnetron sputtering (HiPIMS) is a common way to create a high and dense ionized metallic vapor without the use of an alternative ionizing device, like radio frequency loops. HiPIMS has been used to perform the deposition of platinum thin films in order to control their morphology. This feature known to depend on the energy of the Pt species incoming onto the substrate during the deposition has to be carefully studied. Therefore, it's necessary to study the ions energy distribution during the sputtering pulse and to follow its evolution with the HiPIMS regime. Pictures of this evolution are presented.

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Plasmas
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Dates et versions

hal-00993959 , version 1 (21-05-2014)

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Stéphane Cuynet, Amaël Caillard, Thomas Lecas, Sébastien Dozias, Philippe Lefaucheux, et al.. Influence of the HiPIMS voltage on the time resolved platinum ions energy distributions. IEEE Transactions on Plasma Science, 2014, 42, pp.2818-2819. ⟨10.1109/TPS.2014.2325061⟩. ⟨hal-00993959⟩
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