Efficient directional coupling between silicon and copper plasmonic nanoslot waveguides: toward metal− oxide− silicon nanophotonics - Archive ouverte HAL
Article Dans Une Revue Nano Letters Année : 2010

Efficient directional coupling between silicon and copper plasmonic nanoslot waveguides: toward metal− oxide− silicon nanophotonics

Résumé

Coupling plasmonics and silicon photonics is the best way to bridge the size gap between macroscopic optics and nanodevices in general and especially nanoelectronic devices. We report on the realization of key blocks for future plasmonic planar integrated optics, nano-optical couplers, and nanoslot waveguides that are compatible both with the silicon photonics and the CMOS microelectronics. Copper-based devices provide for very efficient optical coupling, unexpectedly low propagation losses and a broadband sub-50 nm optical confinement. The fabrication in a standard frontline microelectronic facilities hints broad possibilities of hybrid opto-electronic very large scale integration.
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Dates et versions

hal-00992869 , version 1 (19-05-2014)

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Cécile Delacour, Sylvain Blaize, Philippe Grosse, Jean Marc Fedeli, Aurélien Bruyant, et al.. Efficient directional coupling between silicon and copper plasmonic nanoslot waveguides: toward metal− oxide− silicon nanophotonics. Nano Letters, 2010, 10, pp.2922-2926. ⟨10.1021/nl101065q⟩. ⟨hal-00992869⟩
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