Volume charge carrier number fluctuations probed by low frequency noise measurements in InN layers - Archive ouverte HAL
Article Dans Une Revue Applied Physics Letters Année : 2011

Volume charge carrier number fluctuations probed by low frequency noise measurements in InN layers

Résumé

Bulk conduction in molecular beam epitaxial InN layers has been confirmed using low frequency noise measurements versus temperature. A generation-recombination process has been identified at low temperatures 100 K and attributed to a trap with a discrete energy level in the band gap. The energy position of this trap has been determined to be around 52 meV below the conduction band minimum.
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Dates et versions

hal-00976041 , version 1 (09-04-2014)

Identifiants

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Geeta Rani Mutta, Jean-Marc Routoure, Bruno Guillet, Laurence Méchin, Javier Grandal, et al.. Volume charge carrier number fluctuations probed by low frequency noise measurements in InN layers. Applied Physics Letters, 2011, 98 (25), pp.252104-1--3. ⟨10.1063/1.3601855⟩. ⟨hal-00976041⟩
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