Graded and step index buried optical waveguides fabricated from p-type porous silicon : Processing and measurements
Résumé
The realisation of optical buried waveguides fabricated from porous silicon layers is presented. The refractive index of porous silicon layer varies according to its porosity and its oxidisation process conditions. So either step or graded index waveguides are achieved. These waveguides are formed by a localised anodisation of heavily doped P-type silicon wafers. Measurements at a wavelength of l.ôum yield waveguide losses below 4 dB/cm.
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