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Journal Articles Applied Surface Science Year : 1999

Plasma enhanced chemical vapour deposition of SiOxNy in an integrated distributed electron cyclotron resonance reactor

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hal-00915361 , version 1 (07-12-2013)

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  • HAL Id : hal-00915361 , version 1

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A. Hofrichter, Pavel Bulkin, Bernard Drévillon. Plasma enhanced chemical vapour deposition of SiOxNy in an integrated distributed electron cyclotron resonance reactor. Applied Surface Science, 1999, pp.447-450. ⟨hal-00915361⟩
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