AlCoCrCuFeNi high entropy alloy cluster growth and annealing on silicon: A classical molecular dynamics simulation study. - Archive ouverte HAL
Article Dans Une Revue Applied Surface Science Année : 2013

AlCoCrCuFeNi high entropy alloy cluster growth and annealing on silicon: A classical molecular dynamics simulation study.

Résumé

Molecular dynamics simulations are carried out for describing deposition and annealing processes of AlCoCrCuFeNi high entropy alloy (HEA) thin films. Deposition results in the growth of HEA clusters. Further annealing between 300K and 1500K leads to a coalescence phenomenon, as described by successive jump in the root mean square displacement of atoms. The simulated X-ray diffraction patterns during annealing reproduces the main feature of the experiments: a phase transition of the cluster structure from bcc to fcc
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Dates et versions

hal-00904863 , version 1 (18-11-2013)

Identifiants

  • HAL Id : hal-00904863 , version 1

Citer

Lu Xie, Pascal Brault, Anne Lise Thomann, Jean-Marc Bauchire. AlCoCrCuFeNi high entropy alloy cluster growth and annealing on silicon: A classical molecular dynamics simulation study.. Applied Surface Science, 2013, 285P, pp.810-816. ⟨hal-00904863⟩
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