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Article Dans Une Revue Journal of Applied Physics Année : 2013

Revisiting the mechanisms involved in Line Width Roughness smoothing of 193 nm photoresist patterns during HBr plasma treatment

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hal-00904412 , version 1 (14-11-2013)

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M. Brihoum, R. Ramos, K. Menguelti, G. Cunge, E. Pargon, et al.. Revisiting the mechanisms involved in Line Width Roughness smoothing of 193 nm photoresist patterns during HBr plasma treatment. Journal of Applied Physics, 2013, 113, pp.013302. ⟨10.1063/1.4773068⟩. ⟨hal-00904412⟩
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