Thermal conductivity measurement of suspended Si-N membranes from 10K to 275K using the 3 omega-Volklein method - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Journal of Physics: Conference Series Année : 2012

Thermal conductivity measurement of suspended Si-N membranes from 10K to 275K using the 3 omega-Volklein method

Résumé

The thermal properties of suspended thin films prepared by the micro-machining process have been measured using the 3! dynamic method coupled to a Volklein geometry. A transducer (heater/thermometer) centered on the membrane is driven by an ac current causing periodic thermal oscillations. The measurement of the temperature oscillation on the membrane is made at the third harmonic using a Wheatstone bridge set up. Here by coupling the 3! method to a Voolklein geometry (suspended membrane) we obtained a highly sensitive techniqueto measure the thermal conductance with a resolution of (..K=K = 10-3) and a sensitivity of the order of nanoWatt/K, thanks to a very sensitive niobium nitride thermometry. This method is applied to measure the in-plane thermal conductivity of 100 nm silicon nitride membrane, in the temperature range of 10-275 K
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Dates et versions

hal-00861782 , version 1 (03-11-2015)

Identifiants

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Hossein Ftouni, Christophe Blanc, Aurélien Sikora, Jacques Richard, Martial Defoort, et al.. Thermal conductivity measurement of suspended Si-N membranes from 10K to 275K using the 3 omega-Volklein method. Journal of Physics: Conference Series, 2012, 395, pp.012109. ⟨10.1088/1742-6596/395/1/012109⟩. ⟨hal-00861782⟩

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