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Chapitre D'ouvrage Année : 2009

Thermochemical behaviour of organosilicon films deposited by a cold plasma polymerisation process

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hal-00820603 , version 1 (06-05-2013)

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  • HAL Id : hal-00820603 , version 1

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B. Mutel, P. Supiot. Thermochemical behaviour of organosilicon films deposited by a cold plasma polymerisation process. Mittal K.L. Polyimides and other high temperature polymers synthesis, characterization and applications, CRC Press, pp.391-407, 2009, ISBN 978-90-04-17080-3, e-ISBN 978-90-474-2411-6. ⟨hal-00820603⟩
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