Characterization of nano-crystalline diamond films grown by continuous DC bias during plasma enhanced chemical vapor deposition - Archive ouverte HAL
Conference Papers Year : 2009

Characterization of nano-crystalline diamond films grown by continuous DC bias during plasma enhanced chemical vapor deposition

V. Mortet
  • Function : Author
L. Zhang
M. Eckert
  • Function : Author
A. Soltani
J. d'Haen
  • Function : Author
O. Douheret
  • Function : Author
M. Moreau
  • Function : Author
S. Osswald
  • Function : Author
E. Neyts
  • Function : Author
David Troadec
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520
P. Wagner
  • Function : Author
A. Bogaerts
  • Function : Author
G. van Tendeloo
  • Function : Author
K. Haenen
  • Function : Author

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https://hal.science/hal-00800940

Submitted on : Thursday, March 14, 2013-4:49:06 PM

Last modification on : Wednesday, January 24, 2024-9:54:18 AM

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hal-00800940 , version 1 (14-03-2013)

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V. Mortet, L. Zhang, M. Eckert, A. Soltani, J. d'Haen, et al.. Characterization of nano-crystalline diamond films grown by continuous DC bias during plasma enhanced chemical vapor deposition. Materials Research Society Fall Meeting, MRS Fall 2009, Symposium J : Diamond electronics and bioelectronics - Fundamentals to applications III, 2009, Boston, MA, United States. pp.1203-J05-03, 41-46, ⟨10.1557/PROC-1203-J05-03⟩. ⟨hal-00800940⟩

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