High frequency ultrasound, a tool for elastic properties measurement of thin films fabricated on silicon - Archive ouverte HAL Access content directly
Journal Articles Advanced Materials Research Year : 2011
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hal-00795917 , version 1 (01-03-2013)

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Pierre Campistron, Julien Carlier, N. Saad, J. Gao, Malika Toubal, et al.. High frequency ultrasound, a tool for elastic properties measurement of thin films fabricated on silicon. Advanced Materials Research, 2011, 324, pp.277-281. ⟨10.4028/www.scientific.net/AMR.324.277⟩. ⟨hal-00795917⟩
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