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Article Dans Une Revue Nanoscale Research Letters Année : 2013

Microstructure and optical properties of Pr3+-doped hafnium silicate films

Résumé

In this study, we report on the evolution of the microstructure and photoluminescence properties of Pr 3+-doped hafnium silicate thin films as a function of annealing temperature (T A). The composition and microstructure of the films were characterized by means of Rutherford backscattering spectrometry, spectroscopic ellipsometry, Fourier transform infrared absorption, and X-ray diffraction, while the emission properties have been studied by means of photoluminescence (PL) and PL excitation (PLE) spectroscopies. It was observed that a post-annealing treatment favors the phase separation in hafnium silicate matrix being more evident at 950°C. The HfO 2 phase demonstrates a pronounced crystallization in tetragonal phase upon 950°C annealing. Pr 3+ emission appeared at T A = 950°C, and the highest efficiency of Pr 3+ ion emission was detected upon a thermal treatment at 1,000°C. Analysis of the PLE spectra reveals an efficient energy transfer from matrix defects towards Pr 3+ ions. It is considered that oxygen vacancies act as effective Pr 3+ sensitizer. Finally, a PL study of undoped HfO 2 and HfSiO x matrices is performed to evidence the energy transfer.
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Dates et versions

hal-00786011 , version 1 (26-06-2018)

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Yong-Tao An, Christophe Labbé, Larysa Khomenkova, Mag Morales, Xavier Portier, et al.. Microstructure and optical properties of Pr3+-doped hafnium silicate films. Nanoscale Research Letters, 2013, 8, pp.43. ⟨10.1186/1556-276X-8-43⟩. ⟨hal-00786011⟩
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