Optical properties of organic material produced in a dusty plasma
Résumé
Thin films of organic material produced in a dusty plasma in N2-CH4 mixtures are deposited on silicon substrates. The real (n) and imaginary (k) parts of the complex refractive index are determined using the spectroscopic ellipsometry technique in the 370-1000 nm wavelength range. The optical index depend strongly on the methane concentrations: k values decreases with initial CH4 concentration, while the real optical index (n) increases. Thanks to Mid-infrared spectra recorded for thin films, the larger absorption in the visible range is explained by an increase of the secondary and primary amines signatures.
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