On the infuence of CO on a dusty N2-CH4 CCP RF discharge
Résumé
In this work, we report the study of the effect of CO addition to a N2:CH4 RF CCP plasma. Results show that CO impacts some plasma properties such as the self-bias voltage and the methane consumption kinetics. CO introdution modifies slightly the chemical composition of the gaseous products but significantly increases the inclusion of O in dust produced in the discharge.
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