Extreme dielectric strength in boron doped homoepitaxial diamond - Archive ouverte HAL
Article Dans Une Revue Applied Physics Letters Année : 2010

Extreme dielectric strength in boron doped homoepitaxial diamond

Résumé

The fabrication of Schottky diodes withstanding breakdown voltages up to 10 kV is demonstrated. A corresponding electric field of 7.7 MV/cm at the center of the diode is evaluated with the help of a two-dimensional finite elements software. These properties result from a net shallow acceptor concentration below 10(16) cm(-3) in the first micrometers of an epitaxial film with optimized crystalline quality and a special oxidizing treatment of its surface, allowing the true dielectric strength of bulk diamond to be revealed.
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Dates et versions

hal-00734714 , version 1 (24-09-2012)

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Pierre-Nicolas Volpe, Pierre Muret, Julien Pernot, Franck Omnès, Tokuyuki Teraji, et al.. Extreme dielectric strength in boron doped homoepitaxial diamond. Applied Physics Letters, 2010, 97 (22), pp.223501. ⟨10.1063/1.3520140⟩. ⟨hal-00734714⟩
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