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Article Dans Une Revue Defect and Diffusion Forum Année : 2012

Plasma assisted diffusion in porous materials: Experiments, modeling and applications

Résumé

Plasma sputtering deposition of platinum on porous substrates is a relevant way for building high performance catalytic thin films. The knowledge and control of platinum density adsorbed in the porous medium, during deposition, are of primary importance. We show that the experimental concentration depth profiles originate from a superdiffusion phenomenon. Moreover experimental results are well described by a classical porous-fractal diffusion model, for which diffusion coefficient is also time-dependent, even if such a model does not include the proper physical mechanisms.
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hal-00688555 , version 1 (17-04-2012)

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Pascal Brault, Jean-Marc Bauchire, Francois James, Christophe Josserand. Plasma assisted diffusion in porous materials: Experiments, modeling and applications. Defect and Diffusion Forum, 2012, 323-325, pp.387-391. ⟨10.4028/www.scientific.net/DDF.323-325.387⟩. ⟨hal-00688555⟩
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