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Article Dans Une Revue Applied physics. A, Materials science & processing Année : 2000

Thermal stability of amorphous carbon films deposited by pulsed laser ablation

Résumé

Diamond-like carbon (DLC) films have been grown on Si substrates at ambient temperature by the pulsed-laser ablation technique, using pulses of different durations both in the nano- and picosecond ranges and at various energy fluences. The stability of these films was investigated as a function of thermal anneals performed in UHV conditions up to 1273 K. Their physico-chemical properties have been characterized by different techniques including X-ray photo-emission, Auger electron and electron-energy-loss spectroscopies, Raman scattering, spectroscopic ellipsometry and atomic-force microscopy. The thermal stability of the films has been demonstrated to be related to their initial structural (sp3/sp2 ratio) and chemical (contaminant) properties. DLC layers prepared under optimized conditions have been found to show a very good thermal stability up to 900 K.

Dates et versions

hal-00610873 , version 1 (25-07-2011)

Identifiants

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Solenne Rey, F. Antoni, B. Prevot, E. Fogarassy, Jean-Charles Arnault, et al.. Thermal stability of amorphous carbon films deposited by pulsed laser ablation. Applied physics. A, Materials science & processing, 2000, 71, pp.433-439. ⟨10.1007/s003390000618⟩. ⟨hal-00610873⟩

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